The MEMS Technology Lab at ISAS enables the complete manufacture of MEMS structures from the wafer up to dicing and wire bonding of indidivual dies.

Some examples...

Sputter deposition system

Sputtering equipment in a laboratory with gas cabinets and a chemistry bench in the background

© Michael Schneider

DC/RF magnetron sputter deposition

LPCVD

Plasm glow in LPCVD vacuum chamber

© Georg Pfusterschmied

Low Pressure Chemical Vapour Deposition

Photo lithography

Photo resist during spin coating

© Sophia Ewert

DRIE

DRIE system with vacuum chamber and load lock

© Michael Schneider

Deep Reactive Ion Etching (Bosch process)

PECVD

PECVD system with vacuum chamber and load lock

© Michael Schneider

Plasma Enhanced Chemical Vapour Deposition

XeF2 Etching

Xenon difluoride etching system with transparent etching chamber

© Michael Schneider

Xenon difluoride etcher for silicon