Sputtering system

© E308-01

Sputtering system

DC/RF Magnetron Sputtering System

UHV vacuum system

Single 3 cathode configuration

Plasma generator MKS ENI RPG 10

Substrate heating up to 700 °C

Lab-scale HiPIMS system

© E308-01

Lab-scale HiPIMS system

designed by Stefan Rißlegger

Lab-scale HiPIMS System with Focus on the deposition of TM-carbides

In house developed UHV System

Single 3'' cathode configuration

Acetylene (C2H2) process gas

DC, MF, RF and HiPIMS sputtering

Melec SIPP pulse generator

  • Powered by 3x ADL DC generator 3 kW
  • Capable of superimposed DC + HiPIMS signal
  • DC or synchronised bias potential

Substrate heating up to 650 °C

DC/RF Magnetron sputtering systems

© E308-01

DC/RF Magnetron sputtering systems

DC/RF Magnetron Sputtering System

UHV vacuum system

Confocal arrangement of 3 cathodes (1x3'', 2x2'')

Plasma generator MKS ENI RPG 10

Substrate heating up to 700 °C

Ultra high vacuum system developed in-house

© E308-01

Ultra high vacuum system developed in-house

Designed by Philipp Ertelthaler

semi industrial HiPIMS deposition system

in house developed UHV vacuum system

multi cathode configuration

  • 2x6''
  • 2x3''

DC, RF and HiPIMS sputtering

Solvix HiP3 5 kW plasma generators

Substrate heating up to 600 °C

Load-lock transfer system with ability for fully automated deposition runs

Image of the Innova industrial arc evaporation and sputtering system

© Dagmar Fischer

Image of the Innova industrial arc evaporation and sputtering system

Industrial arc evaporation and sputtering system

Equipped with 6 arc sources and 4 sputter sources

Versatile magnetic systems

Balzers central arc etching technology

Deposition temperatures up to 600 °C

Industry 4.0 target material storage system

Capacity for over 2000 6'' targets in Balzers geometry