The Versaprobe III is an X-ray photoelectron spectrometer that was purchased in 2022 with FFG funds for research & development infrastructure support, opens an external URL in a new window as part of the ELSA project.

The Versaprobe III has a scanning, monochromatic X-ray source (Al Kα) that allows the X-ray beam to be focused to diameters of < 10 μm. The acquisition of X-ray induced secondary electron images (SXI) enables "SEM-like" operation, indicating local identification of possible inhomogeneities of the sample surfaces, which can subsequently be chemically analysed.

The Argon2500 cluster source, installed for the first time in Austria, allows the gentle liberation of inorganic materials from organic contamination, as well as the creation of depth profiles of organic materials (e.g. polymers) under mild conditions.

The sample stage in the analysis chamber can be heated or cooled and allows contacting of the sample for in-situ experiments. Transfer from a glovebox or the PHI 710 Auger Nanoprobe is possible via a sample transfer chamber under vacuum or inert gas conditions.

Further components:

  • Twin anode with Mg Kα (1253.6 eV) and Zr Lα (2042.4 eV).
  • Zalar rotation during argon ion sputtering to minimise sputtering artefacts.
  • "Dual beam charge neutralisation with low energy Ar ions and electrons.
  • Electron source for "Reflection Electron Energy Loss Spectroscopy" (REELS)
  • Software package for the evaluation of angle-resolved measurements
Picture of the ultra-high vacuum system of the Versaprobe III  X-ray photoelectron spectrometer labelled are the components: (A) Gas Cluster Ion Gun, (B) Twin X-ray source, (C) Monochromatic X-ray source and hemispherical analyser, (D) "Reflection Electron Energy Loss Spectroscopy" electron source, (E) Monochromatic Ar source, (F) Intro chamber, (G) Additional (pre)vacuum pumps, (H) Magnetic field compensation

© Daniela Miano

Ultra-high vacuum system of the Versaprobe III

UHV System: (A) Gas Cluster Ion Gun, (B) Twin X-ray source, (C) Monochromatic X-ray source and hemispherical analyser, (D) "Reflection Electron Energy Loss Spectroscopy" electron source, (E) Monochromatic Ar source, (F) Intro chamber, (G) Additional (pre)vacuum pumps, (H) Magnetic field compensation

Picture of the inside of the analysis chamber of the Versaprobe III X-ray photoelectron spectrometer

© Daniela Miano

Picture of the inside of the analysis chamber of the X-ray photoelectron spectrometer

Picture of the inside of the analysis chamber of the Versaprobe III X-ray photoelectron spectrometer