The Atomica 8300 system is a commercial TXRF spectrometer developed for wafer surface contamination control for semiconductor industry. It can detect elements form Potassium to Lead. Detection limits are in the range of 1010 atoms/cm2, depending on the element of interest. The system can work with wafers from 100mm to 300mm. It is possible to do spatially resolved measurements on the wafer surface with a resolution of 7mm. The sample can be excited using Mo-Kα, from a 3kW Mo x-ray tube. Monochromatisation is done using a double multilayer monochromator. The fluorescence signal is detected using a Si(Li) detector. In order to reduce scattering radiation between sample and detector the normal air can be displaced by Helium. Sample handling is automated using a robot.

The system is placed in cleanroom environment in order to avoid additional contaminations. For this spectrometer the accreditation according to ISO 17025 was achieved, but is not valid currently.

Picture of the TXRF 8300 wafer analyzer in the cleanroom

Picture of the TXRF 8300 wafer analyzer in the cleanroom

Picture of the wafer carrier for the automatized sample change

Picture of the wafer carrier for the automatized sample change