Imaging, handling and manipulation of material with high resolution are important techniques for various applications of research. Atomic force microscopes (AFM) are one of the most important tools for imaging applications with spatial resolution beyond the diffraction limit of light. The project aims is to build a complete AFM-system, including advanced imaging modes, in cooperation with Anton Paar GmbH.

Project focus

  • High-speed and long stroke Z-actuator
  • Design and implementation of high-speed and low-noise laser-deflection readout system
  • Development of a scanning-lever AFM-system
  • Development of advanced measurement modes

Description

Imaging, handling and manipulation of material with high resolution are important techniques for various applications of research. Atomic force microscopes (AFM) are one of the most important tools for imaging applications with spatial resolution beyond the diffraction limit of light. The project aims is to build a complete AFM-system, including advanced imaging modes, in cooperation with Anton Paar GmbH. The work packages belonging to ACIN includes the development of the AFM-head components, high-speed, vertical Z-actuator, high-speed and low-noise laser-deflection readout system, scanning-lever AFM-system and advanced measurement modes. A follow-up project was focused on the development of functional imaging-modes. Various research fields such as biology, physics or materials science are using such functional imaging-modes like Kelvin-probe force microscopy (KPFM). With KPFM it is possible to map the sample surface potential in a quantitative way with nanometer resolution. At MPEI, a novel feedback based Scanning Probe Microscopy method which enables quantitative surface potential measurements without the need of the DC bias of Kelvin Probe Force Microscopy was developed. This method opens the way to image the surface potential of various samples such as semiconductors or biological cells without the need for applying a disturbing or interfering DC-bias and enables new applications of feedback based KPFM technologies.

AFM and KPFM measurements of a rectangular PMMA structure on a surface. (A) Topography image shows height variations up to 10 nm over a 2 µm scale. (B) KPFM potential map with contrast between −100 mV and +200 mV. (C) AC-KPFM amplitude image with values from −400 mV to +200 mV. (D) AC-KPFM potential reconstruction showing potential range −100 mV to +200 mV.

Fig. 1 Comparison of classical KPFM and AC-KPFMy of a positive charge pattern on PMMA. Topography (A) and surface potential V recorded with classical KPFM (B). (C) amplitude b and (D) surface potential V = −b2 acquired with AC-KPFMy of the same pattern as in (B). The images (C) and (D) were recorded immediately after (A) and (B) without disengaging the tip.

Applications

  • Nanometrology Systems
  • AFM, SPM, KPFM, EFM, MFM, QNM etc.

Related Publications

Project partners

Funding